An intermediate frequency (IF) variable gain amplifier (VGA) with exponential gain control for a radio receiver is fabricated in 0.25-µm CMOS technology. The techniques to improve the bandwidth and to reduce temperature dependence of gain are described. The complete VGA is composed of two stages of linearized transconductance VGA and three stages of fixed gain amplifier (FGA). The complete VGA provides a continuous 10 dB to 76.5 dB gain control range, an IIP3 of -11.5 dBm and an NF of 15 dB at 40 MHz.

A demodulator for short-range wireless interconnect using ASK/CDMA technique has been developed with 0.25 µm CMOS technology. The fabricated demodulator demonstrates the demodulation of 7.35 Mbps bit rate with 31 spread spectrum code length at 10 GHz carrier frequency.

A new analog correlator circuit is proposed for direct sequence code division multiple access (DS-CDMA) demodulator. The circuit consists of only 16 switches, 4 capacitors and 2 level shifters. Control sequence requires only three clock phases. Simulation with code length of 127 reveals that the proposed circuit has a good ability to cancel off the charge error and dissipates 3.4mW at 128MHz. The circuit had been designed using a 0.6µm CMOS process. The area of 256µm 245µm is estimated to be 9 times smaller compared to other reported equivalent analog correlators.

Thickness dependence of breakdown properties in control and N2O-Oxynitrided oxides was investigated. Nitrogen atoms piled up at the Si/SiO2 interface increase charge-to-breakdown (QBD) under substrate injection conditions for oxide thickness below 10 nm, while no meaningful improvement is observed above 10 nm. This thickness dependence is explained by the fact that N2O-oxynitridation reduces oxide defects near the Si/SiO2 interface. N2O-oxynitridation of the oxides reduces the number of neutral electron traps due to the chemical reaction of oxide defect with nitrogen atoms. Electron trapping of N2O-oxynitrided oxides is significantly suppressed; the reduction of electron trapping events into neutral electron traps increases QBD under substrate injection. On the other hand, under gate injection, N2O-oxynitrided oxides show low rate of hole trapping during the initial stress period. However, in heavily injected condition, electron trapping is not suppressed, resulting in little improvement of QBD. In addition, the control and N2O-oxynitrided oxides show quite similar dependence of QBD on stress current density, which is related primarily to the carrier transport phenomena (tunneling, traveling, impact ionization and hole injection).

We propose an ultra low power watch-dog circuit with the use of MOSFETs operation under subthreshold characteristics. The circuit monitors the amount of the product degradation because the subthreshold current of MOSFET emulates the rate of the general chemical reaction. Its operation was verified with both SPICE simulation and the measurement of the prototype chip. The new circuit embedded in a tag attached to any product could dynamically monitor the degradation regardless of storage conditions.